Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry
نویسندگان
چکیده
منابع مشابه
Low-Loss Amorphous Silicon-On-Insulator Technology for Photonic Integrated Circuitry
We report the fabrication of low-loss amorphous silicon photonic wires deposited by plasma enhanced chemical vapor deposition. Single mode photonic wires were fabricated by 193nm optical lithography and dry etching. Propagation loss measurements show a loss of 3.46dB/cm for photonic wires (480×220nm) and 1.34dB/cm for ridge waveguides.
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ژورنال
عنوان ژورنال: Optics Communications
سال: 2009
ISSN: 0030-4018
DOI: 10.1016/j.optcom.2009.01.021